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Wafer Scrubber
TSC-150C/200C/200L
This series comprises special cleaning machines for wafers after polishing. They integrate automatic loading and unloading systems, double-sided PVA scrubbing, mega-sonic cleaning, spin drying & N2 blow drying, and other units. They also enable wet/dry-in and dry-out functions, and are suitable for cleaning various semiconductor wafers after polishing.
  • Cleaning Station

    Belt transfer type 6 station

  • Wafer Size

    3-6 inch

  • Scrub Station *2

    2 PVA brushes, double-sided cleaning

  • Features
    Cleaning process
    Pre-cleaning/double-sided brushing/rinsing/megasonic/blow drying/spin drying
    Type of brush
    PVA brush, double-side scrubbing
    PLC control system
    Touch screen operation
    Automatic system
    Robot arm transportation, cassette in/out, wafer dry in and dry out